肖少庆

编辑:杨茜时间:2019-02-22点击数:

肖少庆

1.个人简介

肖少庆,校聘教授,电子工程系主任,2008年获得上海交通大学博士学位,主要从事新型半导体材料、物理与器件以及低温等离子体物理和应用方面的研究工作,在二维半导体材料的化学气相沉积(CVD)制备与光电性能调控,低温等离子体技术(包括等离子体的产生、控制与应用),硅基太阳能电池中的表面钝化和性能调控等方面取得了一系列创新性成果。已发表SCI论文61篇(第一作者及通讯作者论文30篇),H-index = 15,被引用545次;应邀为Springer和Taylor and Francis撰写专著章节各1章。自2013年加入体育外围投注平台以来,成立了低维半导体材料与器件实验室,搭建了电感耦合等离子体(ICP)系统、非平行板式电容耦合温和等离子体(CCEP)系统和限域空间CVD系统,将先进等离子体技术应用于硅基太阳能电池中的表面钝化和性能调控,将温和等离子体技术应用于二维半导体材料的制备与光电性能的调控,并采用限域空间CVD和反向气流辅助CVD外延法制备了高质量的二维半导体材料,近五年作为第一作者和(或)通讯作者在Nature Communications(影响因子12.353),Materials Science and Engineering R-Reports(影响因子24.480),ACS Applied Materials & Interface(影响因子8.097),Physical Chemistry Chemical Physics(影响因子3.906),Nanotechnology(影响因子3.404)和Applied Surface Science(影响因子4.439)等SCI期刊发表论文21篇,获得国内授权发明专利1项。主持省部级以上纵向项目3项,即国家自然科学基金,江苏省自然科学基金以及江苏省产学研项目,另外还主持两项横向项目。2014年入选无锡市社会事业领军人才,获得2016年中国商业联合会科学技术进步奖二等奖和2018年中国商业联合会科学技术进步奖一等奖,获得2018年江苏省教育教学与研究成果奖(研究类)三等奖,获得体育外围投注平台2015和2016年度至善学者B类称号,获得体育外围投注平台2017年度至善学者A类称号,兼任中国国际石墨烯资源产业联盟国际标准工作委员会委员和全国纳米技术标准化技术委员会低维纳米结构与性能工作组委员。

代表性论文

(1) Xiumei Zhang, Haiyan Nan,Shaoqing Xiao*, Xi Wan, Xiaofeng Gu*, Aijun Du, Zhenhua Ni and Kostya (Ken) Ostrikov, Transition metal dichalcogenides bilayer single crystals by reverse-flow chemical vapor epitaxy, Nature Communications 2019, 10, 598.(影响因子12.353)

(2) X. M. Zhang, H. Y. Nan,S. Q. Xiao*, X. Wan, Z. H. Ni, X. F. Gu* and K. Ostrikov, Shape-uniform, High-quality Monolayer MoS2Crystals for Gate-tuneable Photoluminescence, ACS Applied Materials & Interfaces,2017, 9, 42121-42130(影响因子8.097)(中科院分区1区)

(3) S. Q. Xiao*,S. Xu* and K. Ostrikov*, Low-temperature Plasma Processing for Si Photovoltaics, Materials Science and Engineering R-Reports 2014, 78, 1(影响因子:24.480)(中科院分区1区)

(4) Haiyan Nan, Jie Jiang,Shaoqing Xiao*, Zhirong Chen, Zhongzhong Luo, Xiumei Zhang, Han Qi, Xiaofeng Gu, Xinran Wang and Zhenhua Ni*, Soft Hydrogen plasma induced phase transition in monolayer and few-layer MoTe2, Nanotechnology 2019, 30, 034004.(影响因子:3.404)(中科院分区二区)

(5) Xiaoya Wang, Haiyan Nan*, Wei Dai, Qin Lin, Zheng Liu, Xiaofeng Gu, Zhenhua Ni,Shaoqing Xiao*, Optical studies of the thermal stability of InSe nanosheets, Applied Surface Science 2019, 467-468, 860-867. (影响因子:4.439)(中科院分区二区)

(6) Xiumei Zhang,Shaoqing Xiao*, Haiyan Nan, Xi Wan, Xiaofeng Gu* and Kostya (Ken) Ostrikov, Controllable One-step Growth of Bilayer MoS2-WS2/WS2 Heterostructures by Chemical Vapor Deposition, Nanotechnology 2018, 29, 455707.(影响因子:3.404)(中科院分区二区)

(7) Haiyan Nan, Zhirong Chen, Jie Jiang, Jiaqi Li, Weiwei Zhao, Zhenhua Ni, Xiaofeng Gu andShaoqing Xiao*, The effect of Graphene on surface plasmon resonance of metal nanoparticles, Physical Chemistry Chemical Physics 2018, 20, 25078-25084.(影响因子:3.906)(中科院分区二区)

(8) Xiumei Zhang,Shaoqing Xiao*, Lihong Shi, Haiyan Nan, Xi Wan, Xiaofeng Gu, Zhenhua Ni and Kostya (Ken) Ostrikov, Large-size Mo1-xWxS2and W1-xMoxS2(x=0-0.5) monolayers by confined-space chemical vapor deposition, Applied Surface Science 2018, 457, 591-597.(影响因子:4.439)(中科院分区二区)

(9) Ping Wang,Shaoqing Xiao*, Rui Jia*, Hengchao Sun, Xiaowan Dai, Guoyu Su and Ke Tao, 18.88%-efficient multi-crystalline silicon solar cells by combining Cu-catalyzed chemical etching and post-treatment process, Solar Energy 2018, 169, 153-158.(影响因子:4.374)(中科院分区二区)

(10)L. F. Zhang, S. P. Feng,S. Q. Xiao*, G. Shen, X. M. Zhang, H. Y. Nan, X. F. Gu and K. Ostrikov, Layer-controllable graphene by plasma thinning and post-annealing,Applied Surface Science, 2018, 441, 639-646(影响因子:3.387)(中科院分区2区)

(11)Di Cai,Shaoqing Xiao*, Haiyan Nan, Xiaofeng Gu and Kostya (Ken) Ostrikov, Robust fabrication of quantum dots on few-layer MoS2by soft hydrogen plasma and post-annealing, Particle & Particle Systems Characterization 2018, 35, 1800060.(影响因子:4.384)(中科院分区二区)

(12)J. J. Liu, Y. Yao,S. Q. Xiao*and X. F. Gu,Review of status developments of high-efficiency crystalline silicon solar cells,Journal of Physics D: Applied Physics2018, 51, 123001 (影响因子:2.588)(中科院分区2区)

(13)Y. Yao, X. Y. Xu, X. M. Zhang, H. P. Zhou, X. F. Gu andS. Q. Xiao*Enhanced efficiency in HIT solar cells by gradient doping,Materials Science in Semiconductor Processing, 2018, 77, 16-23(影响因子:2.359)

(14)Y. F. Sha,S. Q. Xiao*, X. M. Zhang, F. Qin and X. F. Gu,Layer-by-layer thinning of MoSe2 by soft and reactive plasma etching, Applied Surface Science, 2017, 411, 182-188.(影响因子:3.387)(中科院分区2区)

(15)S. Q. Xiao*P. Xiao, X. C. Zhang, D. W. Yan, F. Qin, Z. H. Ni*, X. F. Gu, J. H. Zhao and K. Ostrikov*, Atomic-layer soft plasma etching of MoS2, Scientific Reports 2016,6,19945 (影响因子:4.259)

(16)S. Q. Xiao*, S. Xu*, X. F. Gu, D. Y. Song, H. P. Zhou and K. Ostrikov, Chemically active plasmas for surface passivation of Si Photovoltaics, Catalysis Today, 2015, 252, 201 (影响因子:4.636)(中科院分区2区)

(17)S. Q. Xiao*, J. J. Zhou, S. Y. Huang, P. Xiao, X. F. Gu, D. W. Yan and S. Xu, Highly textured conductive and transparent ZnO films for HIT solar cell applications, Journal of Physics D: Applied Physics 2015, 48, 305105(中科院分区2区)

(18)H. P. Zhou, S. Xu*,S. Q. Xiao*and Y. Xiang, Nanocrystalline silicon embedded in silicon suboxide synthesized in high-density inductively coupled plasma, Journal of Physics D: Applied Physics 2015, 48, 445302(中科院分区2区)

(19)S. Q. Xiao*and S. Xu, High-efficiency Silicon Solar Cells-Materials and Device Physics, Critical Reviews in Solid State and Materials Sciences 2014, 39, 277 (影响因子:6.455)(中科院分区2区)

2.研究生教育

硕士生

学术型研究生招生专业:电子科学与技术

专业型研究生招生专业:集成电路工程

3.联系方式

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